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We numerically investigated the possibility to obtain circularly polarized infrared thermal emission from a bilayer scheme taking advantage of the strong anisotropy of low symmetry materials such as -Ga2O3 and -MoO3. Our results show that it is possible to achieve a high degree of circular polarization over 0.85 at two typical emission frequencies related to the excitation of -Ga2O3 optical phonons. Our simple but effective scheme could set the basis for a new class of lithography-free thermal sources for IR bio-sensing. 

Abstract In recent years, the excitation of surface phonon polaritons (SPhPs) in van der Waals materials received wide attention from the nanophotonics community. Alpha-phase Molybdenum trioxide (α-MoO₃), a naturally occurring biaxial hyperbolic crystal, emerged as a promising polaritonic material due to its ability to support SPhPs for three orthogonal directions at different wavelength bands (range 10–20μm). Here, we report on the fabrication, structural, morphological, and optical IR characterization of large-area (over 1 cm²size)α-MoO₃polycrystalline film deposited on fused silica substrates by pulsed laser deposition. Due to the random grain distribution, the thin film does not display any optical anisotropy at normal incidence. However, the proposed fabrication method allows us to achieve a singleα-phase, preserving the typical strong dispersion related to the phononic response ofα-MoO₃flakes. Remarkable spectral properties of interest for IR photonics applications are reported. For instance, a polarization-tunable reflection peak at 1006 cm⁻¹with a dynamic range of ΔR= 0.3 and a resonanceQ-factor as high as 53 is observed at 45° angle of incidence. Additionally, we report the fulfillment of an impedance matching condition with the SiO₂substrate leading to a polarization-independent almost perfect absorption condition (R< 0.01) at 972 cm⁻¹which is maintained for a broad angle of incidence. In this framework our findings appear extremely promising for the further development of mid-IR lithography-free, scalable films, for efficient and large-scale sensors, filters, thermal emitters, and label-free biochemical sensing devices operating in the free space, using far-field detection setups. 

Merging the properties of VO2 and van der Waals (vdW) materials has given rise to novel tunable photonic devices. Despite recent studies on the effect of the phase change of VO2 on tuning near-field optical response of phonon polaritons in the infrared range, active tuning of optical phonons (OPhs) using far-field techniques has been scarce. Here, we investigate the tunability of OPhs of α-MoO3 in a multilayer structure with VO2. Our experiments show the frequency and intensity tuning of 2 cm–1 and 11% for OPhs in the [100] direction and 2 cm–1 and 28% for OPhs in the [010] crystal direction of α-MoO3. Using the effective medium theory and dielectric models of each layer, we verify these findings with simulations. We then use loss tangent analysis and remove the effect of the substrate to understand the origin of these spectral characteristics. We expect that these findings will assist in intelligently designing tunable photonic devices for infrared applications, such as tunable camouflage and radiative cooling devices.